Methods and apparatuses for applying a substrate onto an elevator sheave

ABSTRACT

An elevator maintenance kit is provided for surfacing an elevator sheave that engages with an elevator tension member. The kit includes a substrate with an adhesive backing, and a substrate applicator that is operable to apply the substrate to the sheave as the sheave is rotated. The adhesive backing is operable to attach the substrate to the sheave during the sheave rotation.

BACKGROUND OF THE INVENTION

1. Technical Field

This application is entitled to the benefit of, and incorporates byreference essential subject matter disclosed in PCT Application No.PCT/US2012/036580 filed on May 4, 2012.

This disclosure relates generally to elevators and, more particularly,to methods and apparatuses for applying a substrate onto an elevatorsheave.

2. Background Information

A typical traction elevator car drive system includes a plurality oftension members that serpentine around a plurality of sheaves (alsoreferred to as “pulleys”), and connect a motor to an elevator car and acounterweight. During operation, the motor moves the tension membersabout the sheaves to lift or lower the elevator car within an elevatorhoistway.

Under certain conditions, one or more of the tension members may slipagainst one or more of the sheaves. Buildup of relatively high shearforces between the tension members and the sheaves, for example, maycause one of the tension members to momentarily lose traction with oneof the sheaves. The loss and subsequent re-establishment of traction mayinduce vibrations in the tension members that can produce airborne noisewithin the hoistway and/or structural borne noise within the drivesystem. One approach for reducing such noise is to condition the tensionmembers with a conditioning agent such as, for example, wax. Such anapproach, however, can be time consuming and typically must befrequently repeated.

SUMMARY OF THE DISCLOSURE

According to an aspect of the invention, an elevator maintenance kit isprovided for surfacing an elevator sheave that engages with an elevatortension member. The kit includes a substrate with an adhesive backing,and a substrate applicator that is operable to apply the substrate tothe sheave as the sheave is rotated. The adhesive backing is operable toattach the substrate to the sheave during the sheave rotation.

Alternatively or in addition to this or other aspects of the invention,the substrate also includes a polymer film that is operable to beattached to the sheave with the adhesive backing. In some embodiments,the polymer film comprises ultra high molecular weight polyethylene.

Alternatively or in addition to this or other aspects of the invention,the substrate applicator comprises a flexible substrate carrier sheet towhich the substrate is attached. The carrier sheet is operable to movewith the substrate through the sheave-member interface and compress thesubstrate against the sheave as the sheave is rotated.

Alternatively or in addition to this or other aspects of the invention,the substrate is removably attached to the carrier sheet with anadhesive.

Alternatively or in addition to this or other aspects of the invention,the maintenance kit also includes an adhesive that is operable toremovably attach the carrier sheet to the tension member.

Alternatively or in addition to this or other aspects of the invention,the substrate has a substrate width and a substrate length, and thecarrier sheet has a sheet width and a sheet length. The sheet width isgreater than or equal to the substrate width, and the sheet length isgreater than or equal to the substrate length.

Alternatively or in addition to this or other aspects of the invention,the substrate applicator includes a cylindrical applicator body aroundwhich the substrate is wrapped. The applicator body is operable torotate about an axis thereof and feed the substrate into thesheave-member interface as the sheave rotates.

Alternatively or in addition to this or other aspects of the invention,the applicator body includes one or more annular alignment grooves. Eachof the one or more alignment grooves is operable to mate with arespective annular flange of the sheave.

Alternatively or in addition to this or other aspects of the invention,the applicator body extends between first and second alignment flanges.The alignment flanges are operable to be arranged within a tensionmember engagement groove of the sheave. The substrate is arrangedbetween the alignment flanges.

Alternatively or in addition to this or other aspects of the invention,the maintenance kit also includes an applicator base to which theapplicator body is rotatably connected and supported.

Alternatively or in addition to this or other aspects of the invention,the maintenance kit also includes a second substrate including a secondadhesive backing. The second substrate is wrapped around the applicatorbody. The applicator is further operable to apply the second substrateto the sheave as the sheave is rotated about the axis thereof. Thesecond adhesive backing is operable to attach the second substrate tothe sheave as the second substrate moves through a circumferentiallyextending second sheave-member interface between the sheave and a secondelevator tension member during the sheave rotation.

According to another aspect of the invention, a method is provided forapplying a substrate onto an elevator sheave that engages with anelevator tension member. The method includes steps of: (a) positioning asubstrate applicator adjacent to the sheave, wherein the substrate isengaged with the applicator and includes an adhesive backing; (b)disposing an end of the substrate between the sheave and the tensionmember at a first end of the sheave-member interface; and (c) applyingthe substrate to the sheave by rotating the sheave, and by attaching thesubstrate to the sheave with the adhesive backing during the rotation ofthe sheave.

Alternatively or in addition to this or other aspects of the invention,the sheave has a sheave circumference, the tension member has a memberwidth, and the substrate has a substrate length and a substrate width.The substrate length is greater than or equal to the sheavecircumference, and the substrate width is greater than or equal to themember width.

Alternatively or in addition to this or other aspects of the invention,the applicator comprises a flexible substrate carrier sheet to which thesubstrate is attached. The step of disposing comprises disposing thecarrier sheet and the end of the substrate between the sheave and thetension member, wherein the carrier sheet is arranged between thesubstrate and the tension member. The step of applying further comprisesremoving the carrier sheet from a portion of the substrate that extendsout of a second end of the sheave-member interface.

Alternatively or in addition to this or other aspects of the invention,the method also includes steps of: removably attaching the carrier sheetto the tension member proximate to the first end of the sheave-memberinterface with an adhesive; and removing the carrier sheet from thetension member proximate to the second end of the sheave-memberinterface.

Alternatively or in addition to this or other aspects of the invention,the applicator includes a cylindrical applicator body around which thesubstrate is wrapped. The step of applying includes feeding thesubstrate from the applicator body into the sheave-member interface byrotating the applicator body about an axis thereof during the sheaverotation.

Alternatively or in addition to this or other aspects of the invention,the tension member is arranged in a groove of the sheave, and the grooveextends between first and second annular sheave flanges. The applicatorbody includes one or more annular alignment grooves. The step ofpositioning includes mating each of the one or more alignment grooveswith a respective one of the sheave flanges.

Alternatively or in addition to this or other aspects of the invention,the tension member is arranged in a groove of the sheave, and the grooveextends between first and second annular sheave flanges. The applicatorbody extends axially between a pair of annular alignment flanges. Thestep of positioning includes positioning the alignment flanges withinthe groove between the sheave flanges.

Alternatively or in addition to this or other aspects of the invention,a second substrate is engaged with the applicator and includes a secondadhesive backing. The step of disposing includes disposing an end of thesecond substrate between the sheave and a second tension member at afirst end of a circumferentially extending second sheave-memberinterface between the sheave and the second tension member. The step ofapplying includes: applying the second substrate to the sheave byrotating the sheave about the axis thereof; and attaching the secondsubstrate to the sheave with the second adhesive backing as the secondsubstrate moves through the second sheave-member interface during therotation of the sheave.

The foregoing features and the operation of the invention will becomemore apparent in light of the following description and the accompanyingdrawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagrammatic illustration of an elevator system arranged ina building hoistway.

FIG. 2 is a diagrammatic cross-sectional illustration of a substrate forreducing and/or preventing noise between an elevator sheave and anelevator tension member.

FIG. 3 is a diagrammatic side-sectional illustration of a substrateapplicator for applying a substrate onto an elevator sheave engaged withan elevator tension member.

FIG. 4 is a diagrammatic front view illustration of the substrateapplicator of FIG. 3.

FIG. 5 is another diagrammatic side-sectional illustration of thesubstrate applicator of FIG. 3.

FIG. 6 is another diagrammatic front view illustration of the substrateapplicator of FIG. 3.

FIG. 7 is still another diagrammatic side-sectional illustration of thesubstrate applicator of FIG. 3.

FIG. 8 is still another diagrammatic front view illustration of thesubstrate applicator of FIG. 3.

FIG. 9 is a flow diagram of a method for applying a substrate onto acontact surface of a sheave utilizing the substrate applicator of FIG.3.

FIG. 10 is a diagrammatic side-sectional illustration of anothersubstrate applicator for applying a substrate onto an elevator sheaveengaged with an elevator tension member.

FIG. 11 is a partial diagrammatic front view illustration of thesubstrate applicator of FIG. 10.

FIG. 12 is another diagrammatic side-sectional illustration of thesubstrate applicator of FIG. 10.

FIG. 13 is still another diagrammatic side-sectional illustration of thesubstrate applicator of FIG. 10.

FIG. 14 is a flow diagram of a method for applying a substrate onto acontact surface of a sheave utilizing the substrate applicator of FIG.10.

FIG. 15 is a diagrammatic side-sectional illustration of still anothersubstrate applicator for applying a substrate onto an elevator sheaveengaged with an elevator tension member.

FIG. 16 is a diagrammatic front view illustration of still anothersubstrate applicator for applying a substrate onto an elevator sheaveengaged with an elevator tension member.

FIG. 17 is a diagrammatic front view illustration of a substrateapplicator for applying a plurality of substrates onto an elevatorsheave engaged with a plurality of elevator tension members.

FIG. 18 is a diagrammatic front view illustration of still anothersubstrate applicator for applying a substrate onto an elevator sheaveengaged with an elevator tension member.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 1 illustrates an (e.g., traction) elevator system 20 arranged in abuilding hoistway 26. The elevator system 20 includes an elevator cardrive system 22 that moves an elevator car 24 vertically within thehoistway 26 between, for example, a plurality of elevator landings 28.

The drive system 22 includes a motor 30. The elevator system 20 alsoincludes a counterweight 32, a plurality of elevator sheaves 34, 36, 38and 40, and one or more (e.g., anchored) elevator tension members 42(e.g., ropes, belts, etc.). The elevator system 20 includes one or moresheaves. A first of the sheaves 34 (e.g., a drive sheave) is rotatablyconnected to the motor 30. The elevator system 20 could include one ormore sheaves 38 (e.g., an idler sheave) rotatably connected to thecounterweight 32. The elevator system 20 could include one or moresheaves 36 and 40 (e.g., idler and/or diverter sheaves) rotatablyconnected to the elevator car 24. The tension members 42 are engagedwith (e.g., serpentined around) the elevator sheaves, and connect themotor 30 to the elevator car 24 and the counterweight 32. The presentinvention, however, is not limited to any particular drive systemcomponents and/or configurations.

During elevator system operation, the motor 30 selectively rotates thefirst sheave 34 to move the tension members 42 about the sheaves 36, 38and 40. The movement of the tension members 42, in turn, causes theelevator car 24 and the counterweight 32 to respectively move (e.g.,lift or lower) vertically within the hoistway 26.

Under certain conditions, one or more of the tension members 42 maymomentarily or periodically slip against one or more of the sheaves(e.g., the sheaves 36, 38 and 40) during tension member movement.Buildup of relatively high shear forces between the tension members andthe sheaves, for example, may cause a respective one of the tensionmembers to momentarily lose traction with a respective one of thesheaves. The loss and subsequent re-establishment of traction may inducevibrations in the tension members that can produce airborne noise withinthe hoistway 26 and/or structural borne noise within the drive system22.

FIG. 2 illustrates a substrate 44 (e.g., tape) that is configured toreduce and/or prevent the noise induced by slippage between one or moreof the tension members 42 and one or more of the sheaves (e.g., thesheaves 36, 38 and 40). The substrate 44, for example, may enablelocalized surface slippage (e.g., reduce friction) between one of thetension members and a respective one of the sheaves. Enabling localizedsurface slippage reduces a magnitude of shear forces that can buildupbetween the tension member and the sheave, which may reduce noisegenerating vibrations.

The substrate 44 extends between an exterior substrate surface 46 and aninterior substrate surface 48. The substrate 44 can include a noisereduction, low friction polymer film 50 and an adhesive backing 52. Thepolymer film 50 extends from the exterior substrate surface 46 to theadhesive backing 52. The adhesive backing 52 extends from the polymerfilm 50 to the interior substrate surface 48.

The polymer film 50 may be constructed from, for example, a polyethylene(PE) polymer such as ultra high molecular weight (UHMW) polyethylene. Inanother example, the polymer film 50 may be constructed from afluoropolymer such as polytetrafluoroethylene (PTFE). It is worthnoting, however, that UHMW polyethylene may have improved wearcharacteristics as compared to other polymers such as PTFE; e.g., UHMWpolyethylene exhibits a relatively low material transfer rate. UtilizingUHMW polyethylene therefore can reduce film material transfer onto thetension members, which thereby can reduce the potential for materialtransfer induced slippage between the tension members and the firstsheave 34 (e.g., the drive sheave). The present invention, however, isnot limited to any particular film materials.

The adhesive backing 52 may be constructed from, for example, an acrylicadhesive that is resistant to severe environmental conditions (e.g.,fluctuations between high and low temperatures) as well as aging. Thepresent invention, however, is not limited to any particular adhesivematerials.

An example of a substrate tape with an UHMW polyethylene film and anacrylic adhesive backing is Squeak Reduction Tape 5430, which ismanufactured by 3M™ Corporation of St. Paul, Minn. Another example of asubstrate tape is a PTFE tape with a plurality of indentations and/orprojections arranged thereon. The indentations and/or projections can beadapted to further reduce shear force buildup between the tensionmember(s) and the sheave(s). Examples of indentation/projection shapesinclude, but are not limited to, circles, ovals, triangles, rectangles,hexagons, trapezoids, straight lines and/or wavy lines. Suchindentations and/or projections can also be included on substratesconstructed from various other types of materials such as, for example,UHMW polyethylene, etc.

FIGS. 3-8 illustrate an embodiment of a substrate applicator 54 forapplying the substrate 44 onto a sheave 56 (e.g., the sheave 36 inFIG. 1) and, in particular, onto a tension member contact surface 58.Briefly, referring to FIGS. 3 and 4, the contact surface 58 is engagedwith a tension member 60 (e.g., the tension member 42 in FIG. 1) along acircumferentially extending sheave-member interface 62. The contactsurface 58 is configured within an annular tension member groove 64. Thecontact surface 58 has a surface width 66 that extends axially betweenan annular first flange 68 and an annular second flange 70. The contactsurface 58 also has a surface circumference that extendscircumferentially around the sheave 56, which is equal to or less than alength 72 of the substrate 44.

In the embodiment in FIGS. 3 and 4, the substrate applicator 54 isconfigured as a flexible substrate carrier sheet 74 to which theexterior substrate surface 46 may be removably attached. The carriersheet 74 has a sheet length 76 that extends longitudinally between afirst sheet end 78 and a second sheet end 80, which length 76 is equalto or greater than the substrate length 72. The carrier sheet 74 has asheet width 82 that extends laterally (e.g., axially) between a firstsheet side 84 and a second sheet side 86. The sheet width 82 is equal toor less than the surface width 66, and equal to or greater than a width88 of the substrate 44. The substrate width 88 is equal to or greaterthan a width 90 of the tension member 60. The carrier sheet 74 also hasa sheet thickness that extends between an interior sheet surface 92 andan exterior sheet surface 94.

The carrier sheet 74 is constructed from a flexible material that has amaterial stiffness greater than that of the substrate 44. Examples ofsuch a flexible material include, but are not limited to, sheet plastic,sheet metal, etc. Generally, the sheet thickness is greater than that ofthe substrate 44 to further increase its relative stiffness.

FIG. 9 is a flow diagram of a method for applying the substrate 44 ontothe contact surface 58 utilizing the carrier sheet 74. Referring toFIGS. 3, 4 and 9, in step 900, the exterior substrate surface 46 isremovably attached to the interior sheet surface 92 with a lightadhesive. The exterior substrate surface 46 can be removably attached tothe interior sheet surface 92 with, for example, double sided tape (orfolded tape) having a relatively low tackiness. In step 902, the carriersheet 74 is positioned adjacent to the sheave 56. The exterior sheetsurface 94, for example, is removably attached to the tension member 60with a light adhesive adjacent to the sheave 56.

In step 904, the first sheet end 78 and a respective end 96 of thesubstrate 44 are disposed between the sheave 56 and the tension member60 at a first end 98 of the sheave-member interface 62. This step can beperformed, for example, by positioning the carrier sheet 74 and thesubstrate 44 in the aforesaid location during step 902. Alternatively,this step can be performed by moving the tension member 60 and rotatingthe sheave 56 about its axis in, for example, a counter-clockwisedirection.

Referring to FIGS. 5-9, in step 906, the substrate 44 is applied to thecontact surface 58 by moving the tension member 60 and rotating thesheave 56 in, for example, the counter-clockwise direction. The adhesivebacking 52, for example, attaches the polymer film 50 to the contactsurface 58 as the substrate 44 moves through and is compressed by thecarrier sheet 74 in the sheave-member interface 62. The sheave 56 may berotated one or more rotations, depending on the substrate length, tofully apply the substrate 44 to the sheave 56.

Referring to FIGS. 7 and 9, in step 908, the carrier sheet 74 is removed(e.g., peeled away) from the tension member 60 or the substrate 44proximate a second end 98 of the sheave-member interface 62. The carriersheet 74, for example, can be peeled away from the tension member 60where the carrier sheet 74 remains attached to the tension member 60after the substrate 44 is applied to the contact surface 58.Alternatively, the carrier sheet 74 can be peeled away from thesubstrate 44 where the carrier sheet 74 remains attached to thesubstrate 44 after the substrate 44 application to the contact surface58 (not shown).

FIGS. 10-13 illustrate another embodiment of the substrate applicator 54for applying the substrate 44 onto a sheave 56 (e.g., the sheave 40 inFIG. 1). In the embodiment in FIGS. 10 and 11, the substrate applicator54 includes a cylindrical (e.g., tubular) applicator body 100 aroundwhich the substrate 44 may be wrapped.

The applicator body 100 extends axially between a first body end 102 anda second body end 104. The applicator body 100 includes a base segment106, one or more bridge segments 108 and 110, and one or more annularalignment flanges 112 and 114. The base segment 106 has an outer radialsubstrate contact surface 116 that extends axially between a first baseend 118 and a second base end 120. A first of the bridge segments 108extends axially between the first base end 118 and a first of thealignment flanges 112, thereby forming an outer radial annular firstalignment groove 122 therebetween. A second of the bridge segments 110extends axially between the second base end 120 and a second of thealignment flanges 114, thereby forming an outer radial annular secondalignment groove 124 therebetween. The first alignment flange 112 isarranged adjacent to the first body end 102. The second alignment flange114 is arranged adjacent to the second body end 104.

FIG. 14 is a flow diagram of a method for applying the substrate 44 ontothe contact surface 58 utilizing the applicator body 100. Referring toFIGS. 10, 11 and 14, in step 1400, the substrate 44 is wrapped aroundthe base segment 106 such that, for example, the interior substratesurface 48 is facing the substrate contact surface 116.

In step 1402, the applicator body 100 is positioned adjacent to thesheave 56. The applicator body 100, for example, can be disposed betweenopposing portions of the tension member 60, and each of the alignmentgrooves 122 and 124 is mated with a respective one of the sheave flanges68 and 70.

In step 1404, an end 96 of the substrate 44 is disposed between thesheave 56 and the tension member 60 at the first end 98 of thesheave-member interface 62. A portion of the substrate 44, for example,can be unwrapped from the applicator body 100 and placed into position.

Referring to FIGS. 12-14, in step 1406, the substrate 44 is applied tothe contact surface 58 by moving the tension member 60 and rotating thesheave 56 in, for example, the counter-clockwise direction. The adhesivebacking 52, for example, attaches the polymer film 50 to the contactsurface 58 as the substrate 44 moves through and is compressed by thetension member 60 in the sheave-member interface 62. The applicator body100 rotates concurrently with the sheave 56, thereby feeding thesubstrate 44 into the sheave-member interface 62 for attachment onto thesheave 56. The sheave 56 may be rotated one or more rotations, dependingon the substrate length, to fully apply the substrate 44 to the sheave56. In some embodiments, a portion of the substrate 44 extending betweenthe applicator body 100 and the sheave 56 may be cut where, for example,the substrate 44 has not already been pre-apportioned into fixedlengths.

In an alternative embodiment, for example as illustrated in FIG. 15, thesubstrate 44 can be wrapped around the base segment 106 such that, forexample, the exterior substrate surface 46 is facing the substratecontact surface 116. In such an embodiment, the substrate 44 may crossbetween the applicator body 100 and the sheave 56.

In some embodiments, for example as illustrated in FIG. 16, theapplicator body 100 can be rotatably connected to and support by anapplicator base 126. The applicator base 126 can be configured to beheld by a technician during the application process, or alternativelymounted to a component 128 (e.g., the elevator car 24, the counterweight32, etc.) of the elevator system.

FIG. 17 illustrates an alternate embodiment of a cylindrical applicatorbody 130. In contrast to the applicator body 100 in FIG. 11, theapplicator body 130 includes one or more additional base segments 132.The additional base segments 132 can be utilized during operation, in afashion as described above, to concurrently apply a plurality of thesubstrates 44 to respective tension member contact surfaces 58. In someembodiments, the applicator body 130 can be configured as a single bodyas shown in FIG. 17. In alternative embodiments, the applicator body 130can be configured as a plurality of modular sections.

FIG. 18 illustrates another alternate embodiment of a cylindricalapplicator body 134. In contrast to the applicator body 100 in FIG. 11,the applicator body 134 is configured without the alignment grooves 122and 124 (see FIG. 11). In addition, the applicator body 134 is sizedsuch that the alignment flanges 112 and 114 may be positioned within thetension member groove 64 between the sheave flanges 68 and 70.

In some embodiments, for example as illustrated in FIG. 18, one or moreends 96 of the substrate 44 may be tapered to prevent formation ofabrupt ridges on the sheave 56 after the substrate 44 is applied to thecontact face 58.

While various embodiments of the present invention have been disclosed,it will be apparent to those of ordinary skill in the art that many moreembodiments and implementations are possible within the scope of theinvention. For example, the present invention as described hereinincludes several aspects and embodiments that include particularfeatures. Although these features may be described individually, it iswithin the scope of the present invention that some or all of thesefeatures may be combined within any one of the aspects and remain withinthe scope of the invention. Accordingly, the present invention is not tobe restricted except in light of the attached claims and theirequivalents.

What is claimed is:
 1. A method for applying a substrate onto anelevator sheave that engages with an elevator tension member, the methodcomprising: positioning a substrate applicator adjacent to the sheave,wherein the substrate is engaged with the applicator and includes anadhesive backing; disposing an end of the substrate between the sheaveand the tension member at a first end of a sheave-member interface; andapplying the substrate to the sheave by rotating the sheave, and byattaching the substrate to the sheave with the adhesive backing duringthe rotation of the sheave.
 2. The method of claim 1, wherein the sheavehas a sheave circumference, the tension member has a member width, andthe substrate has a substrate length and a substrate width; and thesubstrate length is one of greater than and equal to the sheavecircumference, and the substrate width is one of greater than and equalto the member width.
 3. The method of claim 1, wherein the applicatorcomprises a flexible substrate carrier sheet to which the substrate isattached; the disposing comprises disposing the carrier sheet and theend of the substrate between the sheave and the tension member, whereinthe carrier sheet is arranged between the substrate and the tensionmember; and the applying further comprises removing the carrier sheetfrom a portion of the substrate that extends out of a second end of thesheave-member interface.
 4. The method of claim 3, further comprising:removably attaching the carrier sheet to the tension member proximate tothe first end of the sheave-member interface with an adhesive; andremoving the carrier sheet from the tension member proximate to thesecond end of the sheave-member interface.
 5. The method of claim 1,wherein the applicator comprises a cylindrical applicator body aroundwhich the substrate is wrapped; and the applying further comprisesfeeding the substrate from the applicator body into the sheave-memberinterface by rotating the applicator body about an axis thereof duringthe sheave rotation.
 6. The method of claim 5, wherein the tensionmember is arranged in a groove of the sheave, and the groove extendsbetween first and second annular sheave flanges; the applicator bodyincludes one or more annular alignment grooves; and the positioningfurther comprises mating each of the one or more alignment grooves witha respective one of the sheave flanges.
 7. The method of claim 5,wherein the tension member is arranged in a groove of the sheave, andthe groove extends between first and second annular sheave flanges; theapplicator body extends axially between a pair of annular alignmentflanges; and the positioning further comprises positioning the alignmentflanges within the groove between the sheave flanges.
 8. The method ofclaim 1, wherein a second substrate is engaged with the applicator andincludes a second adhesive backing; the disposing further comprisesdisposing an end of the second substrate between the sheave and a secondtension member at a first end of a circumferentially extending secondsheave-member interface between the sheave and the second tensionmember; and the applying further comprises applying the second substrateto the sheave by rotating the sheave about the axis thereof, and byattaching the second substrate to the sheave with the second adhesivebacking as the second substrate moves through the second sheave-memberinterface during the rotation of the sheave.